NIOBIUM OXIDE SINTERED COMPACT, SPUTTERING TARGET COMPRISING SINTERED COMPACT, AND METHOD FOR MANUFACTURING NIOBIUM OXIDE SINTERED COMPACT

摘要

The present invention is a niobium oxide sintered compact characterized by having the composition NbOx (2 < x < 2.5). The present invention provides a niobium oxide sintered compact which can be applied as a sputtering target for forming a high-quality resistance change layer for ReRAM. The present invention particularly addresses the problem of providing a high-density niobium oxide sintered compact suitable for stabilization of sputtering.