METHOD OF AND MAGNET ASSEMBLY FOR HIGH POWER PULSED MAGNETRON SPUTTERING

摘要

A magnet assembly for use in high power pulsed magnetron sputtering comprises a configuration of magnets having a magnetic field topology comprising magnetic field components Bx, By and Bz. A tangential magnetic field B// distribution on an x-y plane above the configuration of magnets comprising an outer continuous ring and one or more inner continuous rings contained in the outer continuous ring. A total magnetic field Btot distribution on an x-z plane intersecting the configuration of magnets comprises an outer closed loop and one or more inner closed loops contained in the outer closed loop, where, as a function of x, a tangential magnetic field B// alternates between (a) high field values greater than 200 G and high gradients in the z-direction of at least 1000 G/in, and (b) low field values of less than 50 G and low gradients in the z-direction of at most 250 G/in.

主权项

1. A magnet assembly for use in high power pulsed magnetron sputtering, the magnet assembly comprising:
a configuration of magnets having a magnetic field topology comprising magnetic field components Bx, By and Bz, where x- and y-directions are parallel to the configuration of magnets and a z-direction is normal to the configuration of magnets, wherein a tangential magnetic field B// distribution on an x-y plane above the configuration of magnets comprises an outer continuous ring and one or more inner continuous rings contained in the outer continuous ring, and wherein a total magnetic field Btot distribution on an x-z plane intersecting the configuration of magnets comprises an outer closed loop and one or more inner closed loops contained in the outer closed loop, where, as a function of x, a tangential magnetic field B// alternates between (a) high field values greater than 200 G and high gradients in the z-direction of at least 1000 G/in, and (b) low field values of less than 50 G and low gradients in the z-direction of at most 250 G/in.