SINGLE CRYSTAL SUBSTRATE, SINGLE CRYSTAL SUBSTRATE WITH CRYSTALLINE FILM, CRYSTALLINE FILM, METHOD OF MANUFACTURING SINGLE CRYSTAL SUBSTRATE WITH CRYSTALLINE FILM, METHOD OF MANUFACTURING CRYSTALLINE SUBSTRATE, AND ELEMENT MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a single crystal substrate for epitaxial growth where a crystalline film having stress suppressed or eliminated can be formed, a single crystal substrate with the crystalline film, a crystalline film, a method of manufacturing the single crystal substrate with the crystalline film, a method of manufacturing a crystalline substrate, and an element manufacturing method.SOLUTION: There is provided a method of: staining a region 1b in at least a part of a top surface of a single crystal substrate 1 used for formation of a crystalline film formed through epitaxial growth; forming a single crystalline film 2a on an unstained surface 1a, which is not stained, through epitaxial growth; forming a crystalline film 2b having less crystallinity than the single crystalline film on the stained surface 1b of the single crystal substrate through epitaxial growth; and forming a single crystal substrate with a crystalline film from the crystalline film 2 composed of at least the single crystalline film and the crystalline film having less crystallinity than the single crystalline film and from the single crystal substrate 1.SELECTED DRAWING: Figure 1