| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device which can perform exposure processing with good accuracy by preventing deterioration in a pattern image when a pattern is exposed on a substrate through a projection optical system and a liquid.SOLUTION: There is provided an exposure device which exposes a substrate P by forming a liquid immersion region on a part of the substrate P and projecting a pattern image on the substrate P through a liquid for forming the liquid immersion region and a projection optical system P, where the exposure device comprises a liquid supply mechanism having a supply port 14 arranged so as to face a surface of the substrate P, a buffer space 90 is formed in the flow passage of the liquid supply mechanism and after a predetermined amount or more of a liquid is accumulated in the buffer space 90, the liquid begins to be supplied to the supply port 14.SELECTED DRAWING: Figure 7 |
