发明名称 DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
摘要 A display substrate includes a base substrate, a gate pattern, an active pattern and a data metal pattern. The gate pattern includes a gate electrode on the base substrate. The active pattern overlaps the gate electrode and includes a first active layer, a second active layer and a third active layer. The first active layer includes first amorphous silicon (a-Si:H). The second active layer is disposed on the first active layer and includes second amorphous silicon of which a concentration of hydrogen is higher than that of the first amorphous silicon. The third active layer is disposed on the second active layer and includes third amorphous silicon of which a concentration of hydrogen is substantially the same as that of the first amorphous silicon. The data metal pattern is disposed on the active pattern and includes source and drain electrodes spaced apart from each other.
申请公布号 US2016104803(A1) 申请公布日期 2016.04.14
申请号 US201514702479 申请日期 2015.05.01
申请人 Samsung Display Co., LTD. 发明人 AHN Tae-Young;OH Ji-Hoon
分类号 H01L29/786;H01L27/12 主分类号 H01L29/786
代理机构 代理人
主权项 1. A display substrate comprising: a base substrate; a gate pattern comprising a gate electrode on the base substrate; an active pattern overlapping the gate electrode, the active pattern comprising: a first active layer comprising first amorphous silicon (a-Si:H);a second active layer on the first active layer, the second active layer including second amorphous silicon of which a concentration of hydrogen is higher than that of the first amorphous silicon; anda third active layer on the second active layer, the third active layer including third amorphous silicon of which a concentration of hydrogen is substantially lower than that of the second active layer ; and a data metal pattern on the active pattern, the data metal pattern comprising source and drain electrodes spaced apart from each other.
地址 Yongin-City KR