发明名称 RESISTIVE RANDOM ACCESS MEMORY DEVICE HAVING A NANO-SCALE TIP, MEMORY ARRAY USING THE SAME AND FABRICATION METHOD THEREOF
摘要 The present invention relates to a resistive random access memory device having a nano-scale tip, memory array using the same and fabrication method thereof. Especially, the present invention provides a technique forming a bottom electrode having an upwardly protruding tapered tip structure through etching a semiconductor substrate in order that an electric field is focused on the tip of the bottom electrode across a top electrode and that a region where conductive filaments are formed is maximally minimized or localized.
申请公布号 US2016104838(A1) 申请公布日期 2016.04.14
申请号 US201514797576 申请日期 2015.07.13
申请人 Seoul National University R&DB FOUNDATION ;Gachon University of Industry-Academic cooperation Foundation 发明人 Park Byung-Gook;Cho Seongjae;Jung Sunghun
分类号 H01L45/00 主分类号 H01L45/00
代理机构 代理人
主权项 1. A resistive random access memory device comprising: a bottom electrode formed in a first direction by etching a semiconductor substrate, the bottom electrode having an upwardly protruding tapered tip structure; an interlayer insulating film formed on the bottom electrode, the interlayer insulating film wrapping around the tip structure except for an upper part of the tip structure; a resistance change layer formed on the upper part of the tip structure and the interlayer insulating film; and a top electrode formed on the resistance change layer in a second direction across the bottom electrode over the tip structure.
地址 Seoul KR