发明名称 |
RESISTIVE RANDOM ACCESS MEMORY DEVICE HAVING A NANO-SCALE TIP, MEMORY ARRAY USING THE SAME AND FABRICATION METHOD THEREOF |
摘要 |
The present invention relates to a resistive random access memory device having a nano-scale tip, memory array using the same and fabrication method thereof. Especially, the present invention provides a technique forming a bottom electrode having an upwardly protruding tapered tip structure through etching a semiconductor substrate in order that an electric field is focused on the tip of the bottom electrode across a top electrode and that a region where conductive filaments are formed is maximally minimized or localized. |
申请公布号 |
US2016104838(A1) |
申请公布日期 |
2016.04.14 |
申请号 |
US201514797576 |
申请日期 |
2015.07.13 |
申请人 |
Seoul National University R&DB FOUNDATION ;Gachon University of Industry-Academic cooperation Foundation |
发明人 |
Park Byung-Gook;Cho Seongjae;Jung Sunghun |
分类号 |
H01L45/00 |
主分类号 |
H01L45/00 |
代理机构 |
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代理人 |
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主权项 |
1. A resistive random access memory device comprising:
a bottom electrode formed in a first direction by etching a semiconductor substrate, the bottom electrode having an upwardly protruding tapered tip structure; an interlayer insulating film formed on the bottom electrode, the interlayer insulating film wrapping around the tip structure except for an upper part of the tip structure; a resistance change layer formed on the upper part of the tip structure and the interlayer insulating film; and a top electrode formed on the resistance change layer in a second direction across the bottom electrode over the tip structure. |
地址 |
Seoul KR |