CMP POLISHING AGENT, METHOD FOR MANUFACTURING SAME, AND METHOD FOR POLISHING SUBSTRATE

摘要

The present invention is a CMP polishing agent that contains polishing particles, a protective agent, and water, wherein CMP polishing agent is characterized in that the protective agent is a silsesquioxane polymer having a polar group. Due to this configuration, provided is a CMP polishing agent which has high polishing selectivity and which can reduce polishing damage caused by polishing, in a CMP step.