| 发明名称 |
PHOTOLITHOGRAPHY STRUCTURES AND METHODS |
| 摘要 |
This disclosure provides systems, methods and apparatus including processes that use two layers of resist, with a layer of etch stop material in between. The two layers of resist may be etched in separate processes to form devices having vias with sidewalls that extend through both layers of resist |
| 申请公布号 |
WO2016057220(A1) |
申请公布日期 |
2016.04.14 |
| 申请号 |
WO2015US51656 |
申请日期 |
2015.09.23 |
| 申请人 |
PIXTRONIX, INC. |
发明人 |
VILLARREAL, JAVIER;BROSNIHAN, TIMOTHY;HO, CHIN-YUAN;LIN, HUNG-CHIEN |
| 分类号 |
G02B26/02 |
主分类号 |
G02B26/02 |
| 代理机构 |
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代理人 |
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| 地址 |
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