| 摘要 |
According to one embodiment of the present invention, a blanking aperture array is a blanking aperture array of a charged particle beam imaging apparatus. The blanking aperture array comprises: a substrate including an upper surface wherein an insulating film is provided; a plurality of blanking aperture portions, each of the plurality of blanking aperture portions formed on a substrate, arranged on a penetration hole through which a predetermined beam passes and a relevant insulation layer, and configured to include a blanking electrode causing blanking deflection of the predetermined beam and a ground electrode; and a high-resistivity film covering the insulation layer and at least a part of the ground electrodes and having electric resistance higher than the ground electrodes and lower than the insulating film. According to the present invention, a high-resistivity film, preventing an electrode or wiring from being short-circuited, is able to be easily manufactured with low costs. |
