COMPOSITION FOR FORMING A COATING TYPE SILICON-CONTAINING FILM, SUBSTRATE, AND METHOD FOR FORMING PATTERNS

摘要

The present invention is directed to providing a composition for forming a coating type silicon-containing film, which shows excellent adhesion to a micropattern, and allows easy wet etching with a stripper solution causing no damage on a semiconductor substrate or a coating type organic film or carbon-based CVD film required for a patterning process. The composition for forming a coating type silicon-containing film has at least one silicic acid-based structure represented by Formula (1), and at least one silicon-based structure represented by Formula (2), and further comprises a linkage between the units represented by Formula (2).