| 摘要 |
PROBLEM TO BE SOLVED: To provide an image forming method by reaction development using a carbonate group-containing vinyl polymer, which achieves good development reactivity.SOLUTION: The image forming method by reaction development aims to form a circuit and includes: a step 1 of disposing a photoresist layer comprising a carbonate group-containing vinyl polymer represented by formula (1) below and a photosensitive agent on a substrate and masking the photoresist layer with a desired pattern; a step 2 of exposing the patterned surface of the photoresist layer; and a step 3 of removing the mask and processing the photoresist layer with a developer.SELECTED DRAWING: None |
