| 摘要 |
PROBLEM TO BE SOLVED: To provide a microlithography projection objective lens for imaging into an image plane a pattern arranged in an object plane, capable of suppressing stray light.SOLUTION: Provided is a microlithography projection objective lens 10 for imaging into an image plane a pattern arranged in an objective plane, comprising a first objective lens part 16, a second objective lens part 18, and at least one third objective lens part 20, the second objective lens part 18 defining a light propagation direction that differs from a light propagation direction in the first objective lens part 16 and from a light propagation direction in the third objective lens part 20. The microlithography projection objective lens 10 also includes at least one beam deflecting device 22 disposed between the first objective lens part 16 and second objective lens part 18 and between the second objective lens part 18 and third objective lens part 20, and at least one shield 24 arranged in a region of the beam deflecting device 22 in such a way that direct light leakage from the first objective lens part 16 to the third objective lens part 20 is at least reduced.SELECTED DRAWING: Figure 1 |
