发明名称 メタライゼーション処理、混合物、および、電子デバイス
摘要 One aspect of the present invention is a method of processing a substrate. In one embodiment, the method comprises forming an electrical conductor on or in the substrate by providing a mixture comprising metal particles and an electroless deposition solution and electrolessly depositing a metal matrix and co-depositing the metal particles. In another embodiment, the method comprises forming an electrical conductor on or in the substrate by providing a mixture comprising metal particles and an electrochemical plating solution and electrochemically plating a metal matrix and co-depositing the metal particles. Another aspect of the present invention is a mixture for the formation of an electrical conductor on or in a substrate. Another aspect of the present invention is an electronic device.
申请公布号 JP5901630(B2) 申请公布日期 2016.04.13
申请号 JP20130519184 申请日期 2011.07.01
申请人 ラム リサーチ コーポレーションLAM RESEARCH CORPORATION 发明人 コリクス・アルトゥル;レデカー・フリッツ
分类号 C23C18/31;C23C18/52;C25D7/12;C25D15/02;H01L21/288;H01L21/3205;H01L21/768;H01L23/532 主分类号 C23C18/31
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