| 摘要 |
Provided is a deposition device which can secure work space without vertical overlap of the deposition unit and the units upstream and downstream thereof. This deposition device is provided with a deposition unit (16), and upstream and downstream units (14, 18) arranged to the left and right thereof. The deposition unit (16) is provided with: a deposition roller (70); multiple guide rollers (72); a main chamber (64) having a deposition roller housing unit (74) and, thereabove, a guide roller housing unit (76); first and second process chambers (66, 68) which house multiple deposition process devices (84, 86) to the left and right of the deposition roller housing unit (74); and process chamber support units (104) for supporting the first and second process chambers (66, 68) so as to allow the first and second process chambers (66, 68) to move between a regular position for deposition and a retracted position retracted to the left or right, and between the retracted position and an exposure position separated in the front/back direction. |
