| 摘要 |
PURPOSE: A substrate transferring apparatus and a semiconductor manufacturing apparatus using the same are provided to prevent dust from being scattered in a vacuum chamber by operating a load to transfer a substrate transfer stand. CONSTITUTION: A substrate transfer stand (4) moves between open positions in a vacuum chamber (9). A toggle link device (1) includes a toggle link which is composed of a plurality of link elements which are pivotally connected. A plurality of loads (21) are connected to the substrate transfer stand and the toggle link device via a wall which is formed in the vacuum chamber or a preliminary vacuum chamber (8). The loads transmit the movement operation of an output terminal to the substrate transfer stand. A seal structure (3) hermetically seals a gap between the loads and the wall. |
