发明名称 汚染を測定することにより半導体の製造を制御する方法及び装置
摘要 A device for handling substrates within a semiconductor manufacturing plant having substrate processing equipments, substrate storage means, substrate transport means, and a manufacturing execution system (MES) functionally related with the substrate processing equipments, the substrate storage means and the substrate transport means, including at least one substrate storage and transport box that is transported by the transport means and stored in the storage means; at least one gas analysis device of the gases forming the internal atmosphere of the substrate storage and transport box, which produces analysis signals representative of the quantity of the critical gas that is likely to generate molecular contamination, which is present in the storage and transport box; and an execution device which pilots the transport means and the storage means, with the execution device comprising instructions for detecting a molecular decontamination need as a function of analysis signals emitted by the gas analysis device.
申请公布号 JP5902626(B2) 申请公布日期 2016.04.13
申请号 JP20120543768 申请日期 2010.12.16
申请人 ファイファー バキユーム 发明人 アルノー ファーヴル;ジュリアン ブーヌール
分类号 H01L21/677;H01L21/205;H01L21/3065;H01L21/31 主分类号 H01L21/677
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