发明名称 |
NANOCLUSTER PRODUCTION DEVICE |
摘要 |
Improvement of control of size and structure of nanoclusters with a nanocluster production apparatus is intended. Increase of an obtained amount and a yield of nanoclusters having size and structure, at least one of which is selected, is intended. A nanocluster production apparatus has a vacuum chamber, a sputtering source that generates plasma by pulse discharge, a pulse power supply that supplies a pulsed power to the sputtering source, a first inert gas supply device that supplies a first inert gas to the sputtering source, a nanocluster growth cell stored in the vacuum chamber and a second inert gas introduction device that introduces a second inert gas into the nanocluster growth cell. |
申请公布号 |
EP3006594(A1) |
申请公布日期 |
2016.04.13 |
申请号 |
EP20140803503 |
申请日期 |
2014.05.26 |
申请人 |
JAPAN SCIENCE AND TECHNOLOGY AGENCY;AYABO CORPORATION |
发明人 |
NAKAJIMA, ATSUSHI;TSUNOYAMA, HIRONORI;ZHANG, CHUHANG;AKATSUKA, HIROKI;TSUKAMOTO, KEIZO |
分类号 |
C23C14/32;C23C14/35;H01J27/20;H01J37/08;H01J37/34 |
主分类号 |
C23C14/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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