发明名称 シリコン単結晶育成装置及びシリコン単結晶育成方法
摘要 A silicon single crystal growing apparatus based on a Czochralski method arranges a graphite crucible inside a graphite heater for heating and a quartz crucible inside the graphite crucible and grows a crystal from a raw material melt filling the quartz crucible, and includes a heater outer heat-insulating member outside the graphite heater, a crucible lower heat-insulating member below the graphite crucible, a crucible upper heat-insulating member above straight bodies of the graphite and quartz crucibles, a crucible outer heat-insulating member outside the straight body of the graphite crucible, a crucible inner heat-insulating member inside the straight bodies of the graphite crucible and the quartz crucible, and a heat shielding member above a liquid surface of the raw material melt, the graphite crucible and the quartz crucible being movable upward and downward in a space enclosed with the crucible upper heat-insulating, crucible outer heat-insulating, and crucible inner heat-insulating members.
申请公布号 JP5904079(B2) 申请公布日期 2016.04.13
申请号 JP20120221472 申请日期 2012.10.03
申请人 信越半導体株式会社 发明人 星 亮二;菅原 孝世
分类号 C30B29/06;C30B15/00;C30B15/14 主分类号 C30B29/06
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