发明名称 半導体装置
摘要 According to one embodiment, a semiconductor device includes a semiconductor layer having an opening formed therein, a first insulating layer disposed on a bottom surface of the opening and on a sidewall of the opening, a second insulating layer disposed on the sidewall of the opening above the first insulating layer, the second insulating layer being thinner than the first insulating layer, a field plate electrode disposed on the first insulating layer and the second insulating layer and having a recess extending from an upper surface of the field plate electrode towards the bottom surface of the opening, and a first layer disposed in the recess and including a material that is different from a material of the field plate electrode.
申请公布号 JP5902116(B2) 申请公布日期 2016.04.13
申请号 JP20130061334 申请日期 2013.03.25
申请人 株式会社東芝 发明人 野津 哲郎
分类号 H01L29/78;H01L29/06 主分类号 H01L29/78
代理机构 代理人
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