发明名称 METHOD AND DEVICE FOR CONTACTING A SEMICONDUCTOR SUBSTRATE BY MEANS OF A JET PRINTING METHOD
摘要 The invention relates to a method for contacting a semiconductor substrate by means of an ink-jet printing method, comprising the following method steps: providing a contacting agent in a low-viscosity initial state, driving the low-viscosity contacting agent through an ink-jet nozzle arrangement, exposing the contacting agent to an energy input and/or a chemical reactant in order to convert the contacting agent to a higher-viscosity final state immediately after the contacting agent passes through the nozzle arrangement and/or when the contacting agent hits the semiconductor substrate. The invention further relates to a device for contacting a semiconductor substrate by means of an ink-jet printing method, containing a reservoir having a low-viscosity contacting agent, an ink-jet nozzle arrangement, and an energy-applying unit directed at a jet area of the ink-jet nozzle arrangement and/or at a point of incidence of the contacting agent.
申请公布号 EP2580784(B1) 申请公布日期 2016.04.13
申请号 EP20110714319 申请日期 2011.04.15
申请人 SOLARWORLD INDUSTRIES THÜRINGEN GMBH 发明人 FUNK, KARSTEN
分类号 H01L31/0224;H01L31/18;H05K3/12 主分类号 H01L31/0224
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