| 发明名称 |
Antireflective film comprising large particle size fumed silica |
| 摘要 |
Antireflective films are described comprising a light transmissive substrate and a low refractive index layer disposed on the light transmissive substrate. The low refractive index layer comprises the reaction product of polymerizable resin composition comprising at least 20 wt-% fumed silica. In one embodiment, the polymerizable resin is ethylenically unsaturated. In a favored embodiment, the low refractive index layer increases in porosity from the light transmissive substrate interface to an opposing porous surface. |
| 申请公布号 |
US9310527(B2) |
申请公布日期 |
2016.04.12 |
| 申请号 |
US201213976535 |
申请日期 |
2012.02.17 |
| 申请人 |
3M Innovative Properties Company |
发明人 |
Hao Encai;Zhang Jun-Ying;Kamrath Robert F.;Liu Lan H.;Cheng Ming;Wu Jung-Sheng;Pellerite Mark J.;Pokorny Richard J.;Iyer Suresh S. |
| 分类号 |
G02B1/111;B32B27/20;B32B27/30;B32B5/14 |
主分类号 |
G02B1/111 |
| 代理机构 |
|
代理人 |
Fischer Carolyn A. |
| 主权项 |
1. An antireflective film comprising a light transmissive substrate and a low refractive index layer disposed on the light transmissive substrate forming an interface wherein the low refractive index layer comprises the reaction product of a polymerizable resin composition comprising at least 55 wt % fumed silica and the low refractive index layer is a single layer that increases in porosity from the light transmissive substrate interface to an opposing porous surface, wherein the fumed silica has an average aggregate particle size as measured by intensity of at least 100 nm. |
| 地址 |
St. Paul MN US |
