发明名称 extensômetro e sistema de localização espacial de tais extensômetros
摘要 A strain gauge includes a substrate (2) for mounting an element (3) to be reversibly lengthened by a force applied while displaying a variation in the resistance thereof, the element (3) lengthening itself along an axis for measurement by the gauge. The gauge includes at least one contrast target (5, 6) capable of reflecting an incident light beam, the at least one contrast target (5, 6) being placed on the gauge in a predetermined position that makes it possible to predetermine the center of the axis (4), for measurement by the strain gauge (1), by detecting the position of the at least one contrast target (5, 6).
申请公布号 BR112012003736(A2) 申请公布日期 2016.04.12
申请号 BR20121103736 申请日期 2010.08.12
申请人 EUROPEAN AERONAUTIC DEFENCE AND SPACE COMPANY EADS FRANCE 发明人 CATHERINE BOSQUET;NICOLAS SWIERGIEL;SEBASTIEN DIDIERJEAN
分类号 G01B5/30;G01B7/16;G01B11/02;G01B11/16;G01L1/22;G01M5/00;G01S17/06;G06T7/00 主分类号 G01B5/30
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