| 摘要 |
The present invention relates to an optical imaging device, and more specifically, to an optical imaging device for microlithography. The optical imaging device comprises at least one optical element (109) and at least one support device (104) related to the optical element (109). The support device (104) supports the optical element (109). A first portion (109.1) of the optical element (109) comes in contact with a first surrounding atmosphere, and a second portion (109.2) of the optical element (109) at least temporarily comes in contact with a second surrounding atmosphere. A reduction device (115) which at least reduces a change in a pressure difference between the first and the second surrounding atmosphere is provided. |
