发明名称 |
Nitride light emitting diode and fabrication method thereof |
摘要 |
An epitaxial structure of light emitting diode with a current modulation layer, and more specifically, a high-resistivity material is injected to change the current conduction path, and implementation of the main structure is to grow a high-resistivity material (e.g., InxAlyGa1-x-yN) over the N-type conductive layer or the P-type conductive layer till part of current conduction path is exposed through high-temperature H2 in-situ etching in the reacting furnace and to grow the N-type or the P-type conductive layer for coverage. This design for forming a current modulation layer without second epitaxial growth provides the injected current with a better spreading path in the N-type conductive layer and the P-type conductive layer, which more effectively and uniformly injects the current to the active layer and improves luminous efficiency. |
申请公布号 |
US9312438(B2) |
申请公布日期 |
2016.04.12 |
申请号 |
US201514719269 |
申请日期 |
2015.05.21 |
申请人 |
XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD. |
发明人 |
Lin Wen-Yu;Yeh Meng-Hsin;Lin Kechuang |
分类号 |
H01L33/14;H01L27/15;H01L33/00;H01L33/32;H01L33/06 |
主分类号 |
H01L33/14 |
代理机构 |
Syncoda LLC |
代理人 |
Syncoda LLC ;Ma Feng;Feng Junjie |
主权项 |
1. A nitride light emitting diode, comprising an N-type conductive layer, a P-type conductive layer, and a light-emitting layer between the N-type conductive layer and the P-type conductive layer; a current modulation layer in at least one of the N-type conductive layer or the P-type conductive layer and comprising a nitride insulation material layer with opening structures, wherein the opening structure is configured for current conduction and is etched by injecting H2 into an epitaxial growth reacting furnace; and wherein the opening structures of the current modulation layer have a random and discrete distribution. |
地址 |
Xiamen CN |