Methods of depositing thin films using molybdenum sputtering targets

摘要

In various embodiments, tubular sputtering targets comprising molybdenum are provided and sputtered to produce thin films comprising molybdenum. The sputtering targets may be formed by forming a tubular billet having an inner diameter IDI and an outer diameter ODI, the formation comprising pressing molybdenum powder in a mold and sintering the pressed molybdenum powder, working the tubular billet to form a worked billet having an outer diameter ODf smaller than ODI, and heat treating the worked billet. The sputtering targets may have a substantially uniform texture of (a) a 110 orientation parallel to a longitudinal direction and (b) a 111 orientation parallel to a radial direction.

主权项

1. A method of thin film deposition, the method comprising:
providing within a sputtering apparatus a tubular sputtering target formed by a method comprising:
forming a tubular billet having an inner diameter IDI and an outer diameter ODI, the formation comprising pressing molybdenum powder in a mold and sintering the pressed molybdenum powder,working the tubular billet to form a worked billet having an outer diameter ODf smaller than ODI, andheat treating the worked billet; and sputtering using the tubular sputtering target to produce a thin film comprising molybdenum.