Surface shape measuring apparatus

摘要

In related art, consideration is not given to that a spatial distribution of scattered light changes in various direction such as forward/backward/sideways according to a difference in micro roughness. Particularly, although a step-terrace structure appearing on an epitaxial growth wafer produces anisotropy in the scattered light distribution, consideration is not given to this point in the related art. The invention includes a process in which light is illuminated to a sample surface, plural detection optical systems mutually different in directions of optical axes detect a spatial distribution of scattered light, and a spatial frequency spectrum of the sample surface is calculated.

主权项

1. A surface shape measuring apparatus for obtaining a surface shape of a sample, comprising:
an illumination optical system to illuminate light to the sample, the illumination optical system including a light source and optics, the optics being configured to direct light from the light source to the sample; a plurality of detection optical systems to detect scattered light from the sample and to output a detection signal corresponding to the detected scattered light, each of the plurality optical systems including a detector and an AD convertor; a storage medium which stores a library; and a digital signal processing part which obtains a continuous spatial frequency spectrum of micro roughness of the sample by using detection signals of the plurality of detection optical systems and the library.