Method to fabricate a magnetic head including ion milling of read gap using dual layer hard mask

摘要

A first layered structure includes a magnetic layer, a first hard mask layer, a second hard mask layer, and a first stepping layer. The first stepping layer is etched through to create a sidewall. A mask-width definition layer is deposited on and adjacent to the sidewall, until a mask-width definition layer thickness is achieved adjacent to the sidewall. The mask-width definition layer is removed except on the sidewall. The first stepping layer is removed. The second hard mask layer is etched away, except for a remainder of the second hard mask layer beneath the mask-width definition layer. The first hard mask layer is etched away around the remainder of the second hard mask layer, to form a dual layer hard mask comprising the remainder of the second hard mask layer and the remainder of the first hard mask layer. The magnetic layer is ion milled around the dual hard mask.

主权项

1. A method to manufacture a magnetic head, the method comprising:
providing a first layered structure including a magnetic layer, a first hard mask layer immediately adjacent and contacting the magnetic layer, a second hard mask layer immediately adjacent and contacting the first hard mask layer; and a first stepping layer immediately adjacent and contacting the second hard mask layer; etching through the first stepping layer to create a sidewall of the first stepping layer; depositing a mask-width definition layer on and adjacent to the sidewall, until a mask-width definition layer thickness is achieved adjacent to the sidewall; removing the mask-width definition layer except on the sidewall; removing the first stepping layer; etching away the second hard mask layer except for a remainder of the second hard mask layer beneath the mask-width definition layer; etching away the first hard mask layer around the remainder of the second hard mask layer to define a remainder of the first hard mask layer beneath the remainder of the of the second hard mask layer, to form a dual layer hard mask comprising the remainder of the second hard mask layer and the remainder of the first hard mask layer; and ion milling the magnetic layer around the dual hard mask.