发明名称 Method of measuring flatness of chamfering table
摘要 A method of measuring a flatness of a chamfering table includes the steps of positioning a substrate on the chamfering table, chamfering an edge of the substrate a plurality of times with a chamfering wheel while varying a relative height of the chamfering wheel with respect to a height of the substrate, locating symmetric chamfered points where the chamfered edge is top-bottom symmetric, matching values of the relative height of the chamfering wheel to the found symmetric chamfered points, and obtaining the flatness of the chamfering table from the values of the relative height of the chamfering wheel that are matched to the symmetric chamfered points.
申请公布号 US9310176(B2) 申请公布日期 2016.04.12
申请号 US201414288445 申请日期 2014.05.28
申请人 CORNING PRECISION MATERIALS CO., LTD. 发明人 Han MyeongBo
分类号 G01B5/20;G01B3/10 主分类号 G01B5/20
代理机构 McDermott Will & Emery LLP 代理人 McDermott Will & Emery LLP
主权项 1. A method of measuring a flatness of a chamfering table, comprising: positioning a substrate on the chamfering table; chamfering an edge of the substrate a plurality of times with a chamfering wheel while varying a relative height with respect to a height of the substrate such that the chamfering wheel has different values of the relative height respective times; locating symmetric chamfered points where the chamfered edge is top-bottom symmetric, and matching the values of the relative height of the chamfering wheel to the located symmetric chamfered points; and obtaining the flatness of the chamfering table from the values of the relative height of the chamfering wheel that are matched to the symmetric chamfered points.
地址 ChungCheongNam-Do KR