发明名称 |
Curable composition and method of forming pattern |
摘要 |
A curable composition that can be released from a mold simply within a short period of time after photo-curing by a small mold-releasing force is provided. The curable composition contains a gas-generating agent that generates a gas by pressure application. A method of forming a pattern is also provided. In the method, the mold can be released with a small force. |
申请公布号 |
US9308552(B2) |
申请公布日期 |
2016.04.12 |
申请号 |
US201213682464 |
申请日期 |
2012.11.20 |
申请人 |
Canon Kabushiki Kaisha |
发明人 |
Iida Kenichi;Ito Toshiki |
分类号 |
B82Y10/00;B05D5/00;G03F7/00;B82Y40/00 |
主分类号 |
B82Y10/00 |
代理机构 |
Canon U.S.A. Inc., IP Division |
代理人 |
Canon U.S.A. Inc., IP Division |
主权项 |
1. A method of forming a pattern to provide a cured product provided with the pattern on a substrate to be processed, the method comprising:
arranging a curable composition on a substrate to be processed; bringing a mold having a contact surface provided with a depression pattern into contact with the curable composition on the substrate to be processed; curing the curable composition by irradiating the curable composition being in contact with the mold with heat or light; generating a gas by applying a pressure to the curable composition being in contact with the mold; and releasing the mold and the curable composition from each other, wherein the curable composition comprises a polymerizable monomer, a polymerization initiator, and a gas-generating agent that generates a gas by pressure application, wherein the polymerization initiator initiates polymerization of the polymerizable monomer; and the curable composition cures by polymerization of the polymerizable monomer. |
地址 |
Tokyo JP |