发明名称 Curable composition and method of forming pattern
摘要 A curable composition that can be released from a mold simply within a short period of time after photo-curing by a small mold-releasing force is provided. The curable composition contains a gas-generating agent that generates a gas by pressure application. A method of forming a pattern is also provided. In the method, the mold can be released with a small force.
申请公布号 US9308552(B2) 申请公布日期 2016.04.12
申请号 US201213682464 申请日期 2012.11.20
申请人 Canon Kabushiki Kaisha 发明人 Iida Kenichi;Ito Toshiki
分类号 B82Y10/00;B05D5/00;G03F7/00;B82Y40/00 主分类号 B82Y10/00
代理机构 Canon U.S.A. Inc., IP Division 代理人 Canon U.S.A. Inc., IP Division
主权项 1. A method of forming a pattern to provide a cured product provided with the pattern on a substrate to be processed, the method comprising: arranging a curable composition on a substrate to be processed; bringing a mold having a contact surface provided with a depression pattern into contact with the curable composition on the substrate to be processed; curing the curable composition by irradiating the curable composition being in contact with the mold with heat or light; generating a gas by applying a pressure to the curable composition being in contact with the mold; and releasing the mold and the curable composition from each other, wherein the curable composition comprises a polymerizable monomer, a polymerization initiator, and a gas-generating agent that generates a gas by pressure application, wherein the polymerization initiator initiates polymerization of the polymerizable monomer; and the curable composition cures by polymerization of the polymerizable monomer.
地址 Tokyo JP