CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, MAKING METHOD, PATTERNING PROCESS, AND ELECTRIC/ELECTRONIC PART-PROTECTING FILM

摘要

Provided is a film for protecting electrical and electronic components, which enables an easy formation of patterns. To this end, also provided is a chemically amplified negative resist material which is composed of: (A) a polymeric compound which has a repeating unit represented by chemical formula (1) and includes a silicon skeleton with the weight-average molecular weight of 3,000-500,000; (B) a polyvalent phenol compound; (C) a photoacid generating agent; and (D) a solvent.