| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing carrier for a crystal wafer having sufficient strength, in spite of being constituted by using a normal steel sheet acquirable inexpensively; and to provide a polishing method of the crystal wafer using the polishing carrier.SOLUTION: A polishing carrier 10, which is used when polishing a crystal wafer 20 by a both-face polishing machine, has a steel sheet 11, and a storage hole 12 formed on the steel sheet 11, for holding the crystal wafer 20. Further, a front surface 111 and a rear surface 112 of the steel sheet 11 are coated with a metal film 13. The hardness of the metal film 13 is higher than the hardness of the steel sheet 11 and lower than the hardness of the crystal wafer 20.SELECTED DRAWING: Figure 1 |
