发明名称 CHARGED PARTICLE BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a charged particle beam device with which scattered electrons having wide scattering angles can be detected and a clear observation image of a sample can be obtained.SOLUTION: A charged particle beam device 100 includes: a sample stage 8 for holding a sample 5; an electron beam barrel 1 irradiating the sample 5 held by the sample stage 8 with an electron beam; an FIB barrel (ion beam barrel) 2 irradiating the sample 5 held by the sample stage 8 with an ion beam to conduct etching; and a mobile detector 7 disposed movably on an irradiation axis of the electron beam 1a and detecting scattered electrons which are scattered in the sample 5 with an irradiation of the electron beam 1a and pass through the sample.SELECTED DRAWING: Figure 1
申请公布号 JP2016051591(A) 申请公布日期 2016.04.11
申请号 JP20140176030 申请日期 2014.08.29
申请人 HITACHI HIGH-TECH SCIENCE CORP 发明人 MITSU KIN;ASAHATA TATSUYA
分类号 H01J37/28;H01J37/244;H01J37/317 主分类号 H01J37/28
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