| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam irradiation device capable of achieving uniform irradiation density of charged particles, in the beam irradiation region of a charged particle beam, by more convenient control with high level uniformity.SOLUTION: In charged particle beam irradiation device including charged particle beam generation means capable of emitting a charged particle beam composed of charged particles, facing deflection electrodes arranged on the periphery of the charged particle beam, and having an X-axis direction electrode and a Y-axis direction electrode for deflecting the charged particle beam, and a pedestal for holding a substrate to be irradiated with the charged particle beam, the frequency ratio of an X-axis direction voltage and a Y-axis direction voltage is an irrational number, the charged particle beam performs Lissajous scanning in the charged particle beam irradiation region of the substrate, and the density of the charged particle beam, with which the substrate is irradiated, is made uniform.SELECTED DRAWING: Figure 2 |
