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发明名称
基板处理装置用气体供给喷嘴
摘要
计的物品是基板处理装置用气体供给喷嘴。 本衍生设计与原设计之外观差异在于:如各图所示,两者之尺寸大小略有所不同,因此本案与原设计案之差异些微,不影响原设计与衍生设计之近似。
申请公布号
TWD174920
申请公布日期
2016.04.11
申请号
TW104301010D01
申请日期
2015.02.26
申请人
日立国际电气股份有限公司
发明人
分类号
15-99
主分类号
15-99
代理机构
代理人
林志刚
主权项
地址
日本
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