| 摘要 |
FIELD: instrument engineering.SUBSTANCE: invention can be used to create elastic suspensions, torsion bars and other elements (for example, beams, membranes, strings) of micromechanical devices, for example, silicon gyroscopes and accelerometers. Method of making elastic element of micromechanical device involves oxidation of a flat plate of monocrystalline silicon with surface orientation in the plane (100), execution of three sequences of operations, consisting in photoresist coating application, opening slots in it by double-sided photolithography and etching the oxide at penetrated slots. At first step, oxide etching is carried out up to silicon layer, then to the depth equal to 2/3, and at the third step - up to the depth equal to 1/3 of its initial thickness. Then silicon is etched by liquid up to the depth equal to 0.5 H, and sequence of operations is repeated twice, consisting in oxide etching up to depth equal to 1/3 of its initial thickness and silicon liquid etching.EFFECT: invention improves quality and reproducibility of technology.7 cl, 6 dwg |
