| 摘要 |
The present invention relates to an exhausting apparatus buried in a bottom in order to absorb and exhaust an exhaust gas such as fume generated in a process of operating a semiconductor equipment line. The exhausting apparatus includes: a plurality of absorption boxes (10, 10′) which is buried in the bottom of the equipment line and has an upper surface in which a plurality of absorption holes (10a) for absorbing the exhaust gas are formed; and a manifold (20) for connecting the main exhaust line (L) of an exhaust system (not shown) and a plurality of exhaust hoses (h, h′) connected to the plurality of absorption boxes (10, 10′). |
