APPRARATUS FOR PROCESSING SUBSTRATE

摘要

The embodiment of the present invention relates to a substrate processing apparatus which includes a load lock chamber, a process chamber which is parallel to substrate processing spaces, and a transfer chamber which is located between the load lock chamber and the process chamber and comprises gates penetrating a substrate to transfer the substrate to each of the substrate processing space of the process chamber by an inner substrate transferring robot. The transfer chamber includes a gas injection part which is separated from the center of each of the gates by the same distance. The gas injection part is formed on the bottom of the transfer chamber. So, the generation of the vortex of a gas in a venting process can be prevented.