发明名称 IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD
摘要 An imprint method includes: before contacting a mold with an imprint material on a target shot region, obtaining relative position of the target shot region with respect to the mold, and performing first alignment between the target shot region and the mold by driving a correction unit configured to correct the relative position of the target shot region; after contacting the mold with the imprint material on the target shot region, performing second alignment between the target shot region and the mold by driving the correction unit; and performing the imprint process on the target shot region after the second alignment. The first alignment includes alignment performed based on a driving amount of the correction unit in the second alignment for another shot region where the imprint process has been performed earlier than in the target shot region.
申请公布号 US2016096313(A1) 申请公布日期 2016.04.07
申请号 US201514859510 申请日期 2015.09.21
申请人 CANON KABUSHIKI KAISHA 发明人 Usui Yoshiyuki
分类号 B29C59/02 主分类号 B29C59/02
代理机构 代理人
主权项 1. An imprint method of performing an imprint process of forming a pattern of an imprint material by using a mold on each of a plurality of shot regions of a substrate, the method comprising: before bringing the mold and the imprint material on a target shot region for the imprint process into contact with each other, obtaining relative position between the target shot region and the mold, and performing first alignment between the target shot region and the mold by driving a correction unit configured to correct the relative position between the target shot region and the mold; after bringing the mold and the imprint material on the target shot region into contact with each other, performing second alignment between the target shot region and the mold by driving the correction unit; and performing the imprint process on the target shot region after the second alignment, wherein the first alignment includes alignment performed based on a driving amount of the correction unit in the second alignment for another shot region where the imprint process has been performed earlier than in the target shot region.
地址 Tokyo JP