PARYLENE DEPOSITION PROCESS

摘要

Embodiments of the disclosure generally related to methods of depositing parylene. The methods include introducing a first precursor into a processing chamber, and photolysing the first precursor into a second precursor using ultraviolet radiation. The second precursor is introduced into second and third regions of the processing chamber, separated by respective first and second showerheads. A substrate is exposed to the second precursor in the third region of the processing chamber to facilitate deposition of a parylene film on the substrate.

主权项

1. A method of depositing parylene, comprising:
introducing a first precursor into a first region of processing chamber; exposing the first precursor to ultraviolet radiation to cause photolysis of the first precursor into a second precursor; flowing the second precursor into a second region of the processing chamber, the second region separated from the first region by a first showerhead; flowing the second precursor into a third region of the processing chamber, the third region separated from the second region by a second showerhead; and exposing a substrate within the third region to the second precursor to form a parylene film on the substrate.