COPOLYMER ANDN POLYMER FILM

摘要

The present invention relates to a copolymer comprising: 20 to 90 wt% of a polyamide-based repetitive unit; 2 to 45 wt% of an alkylene oxide repetitive unit having a straight chain or a branched chain of 2 to 10 carbon atoms; and 4 to 38 wt% of a dialkyl siloxane repetitive unit having a straight chain or a branched chain of 1 to 4 carbon atoms, and to a polymer film comprising a base material film including the copolymer, wherein the polymer film has high durability and high thermal resistance.