Provided are a block copolymer and uses thereof. The block copolymer according to the present application exhibits superb characteristics from self-assembly to phase separation, allows a variety of needed functions to be imparted thereto without restraint, and especially, has assured etching selectivity so as to be effectively applied in such an application as pattern forming.
申请公布号
WO2016052999(A1)
申请公布日期
2016.04.07
申请号
WO2015KR10320
申请日期
2015.09.30
申请人
LG CHEM, LTD.
发明人
LEE, MI SOOK;KIM, JUNG KEUN;KU, SE JIN;PARK, NO JIN;LEE, JE GWON;CHOI, EUN YOUNG;YOON, SUNG SOO;RYU, HYUNG JU