| 摘要 |
The purpose of the present invention is to provide a conductive polymer composition which has an excellent antistatic performance and applicability, does not adversely affect a resist, and can be suitably used in lithography using electron beam. The conductive polymer composition contains a polyaniline-based conductive polymer (A) having a repeating unit expressed by chemical formula 1, polyanion (B), and amino acid (C). In the chemical formula, each of R^A1 to R^A4 may independently represent any one of a hydrogen atom, a halogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms and optionally containing a heteroatom, and R^A1 and R^A2, or R^A3 and R^A4 may be bonded to each other to form a ring. |
