| 摘要 |
The invention relates to a mirror arrangement, in particular for a micro lithographic projection exposure apparatus, comprising at least one mirror element (1) bearing a mirror surface provided for reflecting electromagnetic radiation, at least one carrier element (2) comprising a head section (2a), which is provided for receiving at least one mirror element, and also a seat section (2b), and a mount arrangement (3), for receiving the at least one carrier element (2), wherein at least one insertion opening (3a) is formed in the mount arrangement (3), the seat section (2b) of the carrier element (2) plunges into said insertion opening (3a), and a channel device (4a) for guiding a heat transfer medium is formed in the mount arrangement (3) in the region surrounding the seat section (2b). Furthermore, the invention relates to a method for dissipating heat from the region of a mirror arrangement comprising a plurality of mirror elements (1), in which the heat arising at the mirror elements (1) is firstly tapped off by a carrier element (2) and is guided into the region of a mount arrangement (3), wherein a cooling medium is guided in the mount arrangement (3) in a region adjacent to the carrier element (2) and the heat flow flowing away from the carrier element (2) into the mount arrangement (3) is tapped off via the cooling medium. |
