发明名称 A NON-VOLATILE SPLIT GATE MEMORY DEVICE AND A METHOD OF OPERATING SAME
摘要 A non- volatile memory device that a semiconductor substrate of a first conductivity type. An array of non- volatile memory cells is in the semiconductor substrate arranged in a plurality of rows and columns. Each memory cell comprises a first region on a surface of the semiconductor substrate of a second conductivity type, and a second region on the surface of the semiconductor substrate of the second conductivity type. A channel region is between the first region and the second region. A word line overlies a first portion of the channel region and is insulated therefrom, and adjacent to the first region and having little or no overlap with the first region. A floating gate overlies a second portion of the channel region, is adjacent to the first portion, and is insulated therefrom and is adjacent to the second region. A coupling gate overlies the floating gate. A bit line is connected to the first region. A negative charge pump circuit generates a first negative voltage. A control circuit receives a command signal and generates a plurality of control signals, in response thereto and applies the first negative voltage to the word line of the unselected memory cells. During the operations of program, read or erase, a negative voltage can be applied to the word lines of the unselected memory cells.
申请公布号 WO2016053607(A1) 申请公布日期 2016.04.07
申请号 WO2015US50010 申请日期 2015.09.14
申请人 SILICON STORAGE TECHNOLOGY, INC. 发明人 TRAN, HIEU, VAN;NGUYEN, HUNG, QUOC;DO, NHAN
分类号 G11C16/04;G11C16/12 主分类号 G11C16/04
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