发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR CHIP
摘要 A method for manufacturing a semiconductor chip includes forming a front-side groove in a front surface of a substrate; forming a back-side groove wider than the front-side groove by a rotating cutting member from the back surface of the substrate toward the front-side groove; attaching a holding member having an adhesive layer to the back surface of the substrate after forming the back-side groove; dry-washing the back surface before attaching the holding member to the back surface; extending the distance between adjacent semiconductor chips by expanding the holding member attached to the back surface; and separating the semiconductor chips at the extended distance therebetween from the holding member.
申请公布号 US2016099176(A1) 申请公布日期 2016.04.07
申请号 US201514817873 申请日期 2015.08.04
申请人 FUJI XEROX CO., LTD. 发明人 MATSUZAKI Hirokazu;YAMAZAKI Kenji;MURATA Michiaki;HASHIMOTO Takahiro;MINAMIRU Takeshi
分类号 H01L21/78;H01L21/02;H01L21/683;H01L21/304 主分类号 H01L21/78
代理机构 代理人
主权项 1. A method for manufacturing a semiconductor chip comprising: forming a front-side groove in a front surface of a substrate; forming a back-side groove wider than the front-side groove by a rotating cutting member from the back surface of the substrate toward the front-side groove; attaching a holding member having an adhesive layer to the back surface of the substrate after forming the back-side groove; dry-washing the back surface before attaching the holding member to the back surface; extending the distance between adjacent semiconductor chips by expanding the holding member attached to the back surface; and separating the semiconductor chips at the extended distance therebetween from the holding member.
地址 Tokyo JP