发明名称 IMPRINT TEMPLATE AND METHOD FOR MANUFACTURING SAME
摘要 [Problem] To provide a low-cost imprint template with which the trapping of air can be reduced in photocurable imprinting, and which has excellent transferability to a substrate having curvature, and to provide a method for manufacturing this imprint template. [Solution] A template used in UV nano-imprinting, said template characterized by having a flexible, light-transmitting fixed plate (1c), a transparent resin buffer layer (1b) formed on top of the fixed plate, and a resin film mold (1a) adhered in a removable manner to the top of the transparent resin buffer layer (1b), with one or a combination of a plurality of the resin film molds (1a) forming an irregular transfer pattern on the surface thereof.
申请公布号 WO2016051928(A1) 申请公布日期 2016.04.07
申请号 WO2015JP70392 申请日期 2015.07.16
申请人 TOYAMA PREFECTURE;KYORITSU CHEMICAL & CO.,LTD.;ZEON CORPORATION 发明人 OBATA TSUTOMU;YOKOYAMA YOSHIYUKI;NASUNO MASAAKI;KUCHIKI MIKIHARU;AONO TOMOSHI;KASHIWAGI MOTOFUMI
分类号 H01L21/027;B29C33/38;B29C59/02 主分类号 H01L21/027
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