POLYMER LAYER

摘要

The present invention provides a polymer composition, a polymer film, a producing method of a polymer film, and a method for forming patterns. More specifically, the present invention provides: a block copolymer which has excellent self-assembly properties or phase separation properties and can freely give required various functions; a polymer composition applying a polymer capable of giving etching selectivity when the block copolymer implements a self-assembly structure; a polymer film; a producing method of a polymer film; and a method for forming patterns.