| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with little defects and good line edge roughness can be produced.SOLUTION: The resist composition comprises a resin (A1) including a structural unit having an acid-labile group, a resin (A2) including a structural unit having a group represented by formula (Ia), and an acid generator. In formula (Ia), Rrepresents a fluorine atom or a 1-6C fluorinated alkyl group; ring W represents a 5-18C alicyclic hydrocarbon group; n represents an integer of 1 to 6 and when n is 2 or more, a plurality of Rmay be identical or different from each other; * represents a binding site; however, a carbon atom in the ring W is a secondary carbon or a tertiary carbon, and when the carbon atom is tertiary carbon, the group represented by formula (Ia) does not constitute an acid-labile group.SELECTED DRAWING: None |
