发明名称 |
DIMENSION-CONTROLLED VIA FORMATION PROCESSING |
摘要 |
Methods are provided for dimension-controlled via formation over a circuit structure, including over multiple adjacent conductive structures. The method(s) includes, for instance, providing a patterned multi-layer stack structure above the circuit structure, the stack structure including at least one layer, and a pattern transfer layer above the at least one layer, the pattern transfer layer being patterned with at least one via opening; providing a sidewall spacer layer within the at least one via opening to form at least one dimension-controlled via opening; and etching through the at least one layer of the stack structure using the at least one dimension-controlled via opening to facilitate providing the via(s) over the circuit structure. In one implementation, the stack structure includes a trench-opening within a patterned hard mask layer disposed between a dielectric layer and a planarization layer, and the via(s) is partially self-aligned to the trench. |
申请公布号 |
US2016099171(A1) |
申请公布日期 |
2016.04.07 |
申请号 |
US201514969154 |
申请日期 |
2015.12.15 |
申请人 |
GLOBALFOUNDRIES Inc. |
发明人 |
HU Xiang;REN Yuping;BEI Duohui;GU Sipeng;LIU Huang |
分类号 |
H01L21/768;H01L21/311 |
主分类号 |
H01L21/768 |
代理机构 |
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代理人 |
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主权项 |
1. A method comprising:
forming at least one via over a circuit structure, the forming comprising:
providing a patterned multi-layer stack structure above the circuit structure, the patterned multi-layer stack structure comprising at least one layer, and a pattern transfer layer above the at least one layer, the pattern transfer layer being patterned with at least one via opening therein;providing a sidewall spacer layer within the at least one via opening to form at least one dimension-controlled via opening; andetching through at least the at least one layer of the patterned multi-layer stack structure using the at least one dimension-controlled via opening to facilitate providing the at least one via over the circuit structure: andwherein the etching through the at least one layer of the patterned multi-layer stack structure using the at least one dimension-controlled via opening is partially blocked by a patterned hard mask layer in a first direction, limiting width of the at least one dimension-controlled via opening in the first direction at a bottom of the at least one layer, and wherein width of the at least one dimension-controlled via opening in a second direction, transverse to the first direction, is controlled at the bottom of the at least one layer by a thickness of the provided sidewall spacer layer within the at least one via opening. |
地址 |
Grand Cayman KY |