发明名称 SILICONE SKELETON-CONTAINING POLYMER COMPOUND AND METHOD FOR PRODUCING SAME, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, AND SUBSTRATE
摘要 The present invention provides a silicone skeleton-containing polymer compound containing a repeating unit shown by the general formula (1) and having a weight average molecular weight of 3,000 to 500,000. There can be provided a silicone skeleton-containing polymer compound suitable used as a base resin of a chemically amplified negative resist composition that can remedy the problem of delamination generated on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern without generating a scum and a footing profile in the pattern bottom and on the substrate when the widely used 2.38% TMAH aqueous solution is used as a developer.;
申请公布号 US2016097973(A1) 申请公布日期 2016.04.07
申请号 US201514855163 申请日期 2015.09.15
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 URANO Hiroyuki;IIO Masashi;TAKEMURA Katsuya;HASEGAWA Koji;FUKUSHIMA Masahiro;FUJIWARA Takayuki
分类号 G03F7/075;G03F7/20;C08G77/18;G03F7/32;G03F7/40;C08G77/16;G03F7/16;G03F7/38 主分类号 G03F7/075
代理机构 代理人
主权项 1. A silicone skeleton-containing polymer compound comprising a repeating unit shown by the general formula (1) and having a weight average molecular weight of 3,000 to 500,000, wherein R1 to R4 may be the same or different and represent a monovalent hydrocarbon group having 1 to 8 carbon atoms; “m” is an integer of 1 to 100; “a”, “b”, “c”, “d”, “e”, and “f” are each 0 or a positive number, and “g” and “h” are each a positive number, provided that a+b+c+d+e+f+g+h=; X is a divalent organic group shown by the general formula (2); Y is a divalent organic group shown by the general formula (3); W is a divalent organic group shown by the general formula (4); and U is a divalent organic group shown by the general formula (5), wherein Z represents a divalent organic group selected from any of the dotted line represents a bond; “n” is 0 or 1; R5 and R6 each represent an alkyl group or alkoxy group having 1 to 4 carbon atoms and may be the same or different; and “x” is 0, 1, or 2; wherein V represents a divalent organic group selected from any of the dotted line represents a bond; “p” is 0 or 1; R7 and R8 each represent an alkyl group or alkoxy group having 1 to 4 carbon atoms and may be the same or different; and “y” is 0, 1, or 2; wherein the dotted line represents a bond; T represents an alkylene group having 1 to 10 carbon atoms or a divalent aromatic group; and R9 represents a hydrogen atom or a methyl group; wherein the dotted line represents a bond; T and R9 have the same meanings as defined above; and R10 represents a monovalent carboxyl-containing organic group.
地址 Tokyo JP